ISSN 0005-2531 (Print) ISSN 2522-1841 (Online)
COPOLYMERS ON THE BASIS OF (p-CHLOROPHENOXYCARBONYL)-CYCLOPROPYL STYRENE WITH STYRENE AND METHYL METHACRYLATE
A.I.Sadygova

The radical copolymerization of (p-chlorophenoxycarbonyl)cyclopropyl styrene with styrene and methyl methacrylate has been carried out. New cyclopropane-containing copolymers have been obtained. It has been established that the synthesized copolymers due to peculiarities of their structure and polyfucntionality, namely with content of carbonyl and cyclopropane groups sensitive to UV irradiation in the macromolecule have photosensitivity. The constant values of relative activity of monomers have been determined and Q-e parameters on Alfrey and Price have been calculated. The copolymerization constants of this compound (r1) with styrene and methyl methacylate (r2), calculated on Fineman-Ross method are:  r1 = 1.1 and1.05, but r2 = 0.56 and 0.48, respectively; Q and e parameters values: Q1 = 3.1 and 2.4, e1 = –1.4 and –0.8, respectively. The photochemical structuring has been investigated and it has been shown that the structuring process proceeds due to of cyclopropane ring opening and carbonyl group. The composition and structure of these copolymers have been established and their some characteristics (heat resistance, hardness, adhesive strength, water absorption) have been investigated. The structuring process has been also studied and it has been established that the synthesized copolymer has relatively high photosensitivity (50–55 cm2×J-1)

doi.org/10.32737/0005-2531-2022-3-45-50

Keywords : microstructure, monomers, copolymerization, (p-chlorophenoxy)cyclopropyl styrene, photosensitivity
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SUBMITION
THE LAST NUMBER OF THE JOURNAL
№3 2022
CONTENT
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